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| CNS Training Events - Registration Page |
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Registration is currently open for the following training sessions: |
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Thursday, May 23rd, 2013 |
Training - Atomic Force Microscopy Part-2 Individual User Qualification (MFP3D -AFM) - LISE G12
Trainer: Jason Tresback
This training event is designed to allow individual users to operate the Asylum MFP3d AFM with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own sample and/or probe tip’s, otherwise they will be provided for training purposes. Full tool access requires attending part 1-basic operation and demonstration by staff, followed by at least one user assisted session on another day that serves as an individual user qualification, and users are encouraged to bring a sample. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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2:00 pm - 5:00 pm
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3 |
1 |
Register!
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Training - Cleabroom Orientation (Nanofabrication)-Thursday - LISE-G07, outside the cleanroom door
Trainer: Jiangdong Deng
Cleanroom orientation is required to get the cleanroom access. Staff will bring you into the main cleanroom and introduce the gowning protocol, facilities and equipment in each technique area, safety rules in the cleanroom, and others. |
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Time |
Max Attendees |
Available |
Open Event! |
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2:30 pm - 4:00 pm
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5 |
FULL |
Registration Closed
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Seminar - CNS LUNCH SEMINAR: Tunable Resistive Pulse Sensors for High Resolution Nano/Micro-Particle Analysis - LISE 303
Trainer: Fettah Kosar
Accurate high resolution characterization of complex systems such as viruses, microvesicles and drug delivery particles is critical to understanding their function and optimization. Tunable resistive pulse sensors (TRPS) have generated considerable interest for their ability to accurately characterize the size, charge and concentration of nano to micro-scale particulate suspensions. Measuring the properties of each particle as is passes through the elastic pore sensor provides high resolution analysis often beyond that of other analysis techniques. Furthermore, the recently developed capability to simultaneously measure the size and charge on a particle-by-particle basis provides a unique method to better characterize and understand the role that these properties play. The fundamental principles behind TRPS and how it has been used to improve the characterization of particle size, charge and concentration within complex (e.g. polydisperse or multimodal size and charge) suspensions will be discussed. These techniques have been used to characterize a wide range of synthetic and biological particle systems including adenovirus, exosomes, DNA coated particles, Baculovirus occlusion bodies, and Prochlorococcus as well as study the surface modification, aggregation, and storage effects on liposomes.
SPEAKER BIOGRAPHY: Dr. Darby Kozak is the Chief Scientist for Izon Science US, where he is in charge of developing new analysis capabilities and applications for the suite of Izon instruments. He was recently selected as an as an ‘Emerging Leader in Colloid and Interface Science’ by the Colloid division of the Royal Australian Chemical Institute and has authored 23 articles, a book chapter, and has presented at over 15 international conferences. Darby gained his BSc in Chemical Engineering from the University of Washington, USA in 2001 and his PhD in 2005 from the University of Bristol, UK where he studied non-ionic surfactants for stabilizing non-aqueous colloidal dispersions.
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Time |
Max Attendees |
Available |
Open Event! |
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11:00 am - 2:00 pm
Seminar: 11:00am Lunch: 12:00pm Instrument Demo: 12:30pm |
40 |
12 |
Register!
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Training - CVD-2 Nexx ECR PECVD Training -
Trainer: Ling Xie
NEXX CVD-2 is an ECR (electron cyclotron resonance) plasma-enhanced CVD system. ECR technology produces high plasma density and low ion energy at low chamber pressure, allowing the deposition of high-quality films at relatively low temperature. The system is integrated with a load-lock wafer transfer, allowing fast system pump-down and low base pressure (10-6 to 10-7 Torr). Backside helium cooled chuck allows substrate temperature to be controlled in < 120 ºC range. The entire system is fully computer controlled. Available gases are He, N2, O2, 3% SiH4 and Ar. Films that can be deposited include SiO2, SiN4 and a-Si thin films. |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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1:30 pm - 3:00 pm
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4 |
2 |
Register!
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Training - DelsaNano C Training - Particle Size - LISE G06
Trainer: Fettah Kosar
Beckman Coulter DelsaNano C is a user-friendly dynamic light scattering instrument, which can analyze size as well as zeta potential of nanoparticles (about 1nm - 6um). This training covers the size measurement portion. Zeta potential training can be arranged as a one-on-one assisted session after taking this first training. For more information about our DelsaNano C, please visit the instrument's webpage at:
http://www.cns.fas.harvard.edu/facilities/tool.php?MID=181
PREREQUISITES: "LISE G06 Room Training" and "CNS Nanoparticle Safety Requirements Form" must be completed prior to attending this training.
http://www.cns.fas.harvard.edu/users/Forms/FM008_r1_3_Pre-Training_Requirements_for_Working_with_Nanoparticles.pdf
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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2:00 pm - 4:30 pm
Meet at the entrance of LISE G06. |
2 |
FULL |
Registration Closed
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Training - G06 CHEMICAL NANOTECHNOLOGY ROOM TRAINING - LISE G06
Trainer: Monica Zugravu
Safety features of the Chemical Nanotechnology room including the two ReynoldsTech wet benches will be presented.
Please be on time. I will wait for you 10 min. max. and then I will start the training inside G06. Unfortunately, if you are late, I may not hear you knock on the door while I give the training. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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11:30 am - 12:00 pm
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5 |
4 |
Register!
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Training - Introduction to Photolithography/Contact Aligner Training - Meet in the photolithography bay of the cleanroom - please be prompt!
Trainer: Steven Hickman
Training on the use of the MJB3 and MJB4 contact aligners, with a focus on positive resist processes. Resist development is also demonstrated. Both wet bench training and cleanroom photolithography spinner training are required before taking this class. If you will primarily be working with SU-8, a recommended alternative is "SU-8 process training". |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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1:00 pm - 2:30 pm
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4 |
1 |
Register!
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Training - Photolithography (Headway) Spinner Training - Meet in the photolithography bay of the cleanroom - please be prompt!
Trainer: Steven Hickman
Training on the use of the Headway resist spinners. Will cover general operation of the spinners, with a focus on preparing positive resist films. Wet bench training is required before taking this class. |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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9:00 am - 11:00 am
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6 |
2 |
Register!
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Training - RIE-6 Nexx ECR RIE Training - LISE CNS Cleanroom G 07 at the tool
Trainer: Ling Xie
NEXX RIE-6 is an ECR (electron cyclotron resonance) RIE system. ECR technology produces high plasma density and low ion energy at low chamber pressure and results in low plasma damage and high etch rate. The system is integrated with a load-lock wafer transfer, allowing fast system pump-down and low base pressure (10-6 to 10-7 Torr). Backside helium cooled chuck allows substrate temperature to be controlled < 120 ºC. The entire system is fully computer controlled. Available gases on this tool include He, Ar, O2, CF4, CHF3, Cl2, CH4, and H2. Except polymer stripping, all other materials’ dry etchings are allowed. |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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3:00 pm - 4:30 pm
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4 |
4 |
Register!
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Friday, May 24th, 2013 |
Training - Advanced training on WiTec NSOM/AFM/Raman system - LISE-G12
Trainer: Jiangdong Deng
This is an advanced training course on the WiTec NSOM/AFM/Raman microscope system. Before take this training, WiTec Raman training is required. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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1:30 pm - 3:30 pm
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2 |
2 |
Register!
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Training - Disco ADA-321 Automatic Dicing Saw Training Part 2-User Qualification - LISE G06
Trainer: Jason Tresback
This training event will allow individual users to operate the dicing saw with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own samples, otherwise a one will be provided for training purposes. Full tool access requires attending part 1-basic operation and demonstration by staff, followed by individual User qualification on another day, AND completion of the LISE G06 Room Safety Training events. Please register for each event. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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2:00 pm - 5:00 pm
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3 |
3 |
Register!
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Training - JA Woollam Spectroscopic Ellipsometer - LISE-G07, metrology bay
Trainer: Jiangdong Deng
This trainng will cover the basic principle, operation procedure and data analysis (basic) of JAW spectro-ellipsometer. |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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10:00 am - 12:00 pm
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4 |
2 |
Register!
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Training - RIE-1 SouthBay RIE - LISE CNS Cleanroom G 07 in Dry Processing Bay
Trainer: Ling Xie
The SouthBay reactive ion etcher is for anisotropic etching. It is a capacitive coupled parallel plate plasma reactor and equipped with 200W RF generator, manual matching network, 6� sample stage, and turbo pump. Available etching gases with this tool include SF6, CF4, CHF3, O2, and Ar.
It can be used to etch Si, SiO2, Si3N4, W, Ti, and other substrate materials |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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11:00 am - 12:00 pm
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4 |
FULL |
Registration Closed
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Training - SEM training part 1 - LISE 303
Trainer: Dave Lange
Introduction to using the SEM. Lecture will discuss the SEMs available at CNS (EVO conventional SEM and the Supra and Ultra FESEMs) and the detectors available on them. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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2:00 pm - 4:30 pm
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12 |
FULL |
Registration Closed
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Tuesday, May 28th, 2013 |
Training - Atomic Force Microscopy Part-1 Basic Training (Asylum MFP3D- AFM) - LISE G12
Trainer: Jason Tresback
This training event will focus on the basic imaging and operation of two Asylum Research MFP3D AFMs available at CNS (SPM-1 and 2). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic operation and imaging demonstrated by staff followed by part-2, individual user assisted qualification on another day. Please register for each event. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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10:00 am - 12:00 pm
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5 |
FULL |
Registration Closed
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Training - B15A Safety Training - LISE B15A
Trainer: Andrew Magyar
Safety training to enter or use any equipment in B15A. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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10:00 am - 10:30 am
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10 |
8 |
Register!
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Training - Basic fluorescence confocal microscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Olympus FV300 laser scanning confocal system with 405, 488, 543, and 632 nm lines. 3D reconstruction of data using ImageJ is also covered. This training is also required for second harmonic generation imaging, two photon fluorescence imaging, or coherent anti-stokes Raman imaging. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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10:30 am - 12:00 pm
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3 |
3 |
Register!
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Training - Cleanroom Orientation (Nanofabrication)- Tuesday - LISE-G07, outside the cleanroom door
Trainer: Jiangdong Deng
Cleanroom orientation is required to get the cleanroom access. Staff will bring you into the main cleanroom and introduce the gowning protocol, facilities and equipment in each technique area, safety rules in the cleanroom, and others. |
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Time |
Max Attendees |
Available |
Open Event! |
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1:00 pm - 2:30 pm
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5 |
5 |
Register!
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Training - Contact angle measurement - LISE G06
Trainer: Arthur McClelland
Learn to use the static contact angle setup to help characterized surface free energy of samples. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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3:30 pm - 4:00 pm
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3 |
3 |
Register!
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Training - CVD-3 STS PECVD Training - LISE CNS Cleanroom G 07 at the tool
Trainer: Ling Xie
This STS PECVD system is a dual frequency powered parallel electrode reactor. Its top electrode is powered with two generators. One is a standard rf and also called high frequency power supply (HF, 13.56 MHz). Its power control range is 10W to 600W. The second one is a low frequency (LF, 380 kHz) power supply with a power range of 10W to 1000W. The tool has three operation modes, HF, LF, and MF (mixed frequency). Under MF, the top electrode is powered alternately with HF and LF to tailor film stress by varying the HF/LF power-on ratio. The substrate temperature control is from room temperature to 300ºC. Available gases are: SiH4, NH3, N2O, N2, O2, Ar, 1%PH3/Ar, and 1% B2H6/H2.
Films that can be deposited using this tool include: SiO2, Si3N4, low-stress Si3N4, amorphous Si, phosphorus and boron doped all above films.
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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1:30 pm - 3:00 pm
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4 |
3 |
Register!
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Training - Denton e-beam evaporator (EE-4) - LISE G07 (cleanroom); PVD Bay
Trainer: Ed Macomber
Use of the EE-4 for thin film metal deposition is covered by going through a standard deposition. EE-4 is fully automated and can deposit the following materials: Au, Pt, Ag, Ti, Ge, Pd. These are the only materials that can be used in EE-4. We use a test sample for a quick deposition, which is all that's required for the training. Plan on ~1 hr for this training. We meet promptly right at the machine in the LISE CR PVD bay. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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5:00 pm - 6:00 pm
(check links in confirmation email for documents) |
5 |
4 |
Register!
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Training - Denton e-beam evaporator (EE-4) - LISE G07 (cleanroom); PVD Bay
Trainer: Ed Macomber
Use of the EE-4 for thin film metal deposition is covered by going through a standard deposition. EE-4 is fully automated and can deposit the following materials: Au, Pt, Ag, Ti, Ge, Pd. These are the only materials that can be used in EE-4. We use a test sample for a quick deposition, which is all that's required for the training. Plan on ~1 hr for this training. We meet promptly right at the machine in the LISE CR PVD bay. |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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5:00 pm - 6:00 pm
(check links in confirmation email for documents) |
5 |
5 |
Register!
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Training - FESEM training part 2 (prerequisite SEM training part 1) - B15D
Trainer: Dave Lange
Basic training to use the Ultra and Supra FESEMs |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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1:00 pm - 5:00 pm
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4 |
FULL |
Registration Closed
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Training - Finetech Flip Chip Bonder - LISE G12
Trainer: Guixiong Zhong
Basic training for the Finetech Flip chip bonder. Fineplacer Lambda Manual Sub-Micron Flip-Chip Bonder provides accurate alignment and placement of a device chip to a substrate as an advanced form of chip interconnection. During the bonding process, both chip and substrate are typically heated to an alloying temperature of the interconnect material. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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2:00 pm - 4:00 pm
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2 |
1 |
Register!
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Training - Fourier Transform Infrared (FTIR) Spectoscopy - LISE G04
Trainer: Arthur McClelland
FTIR is a vibrational spectroscopy technique used primarily for chemical identification. Transmission, variable angle specular reflection, variable polarization, and attenuated total reflectance (ATR-FTIR) techniques are all covered. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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1:00 pm - 2:00 pm
Feel free to bring a sample to test |
3 |
2 |
Register!
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Training - LISE G04 orientation and safety training - LISE G04
Trainer: Arthur McClelland
Lab orientation and safety training required for access to the LISE G04 optics lab. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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12:00 pm - 12:30 pm
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5 |
5 |
Register!
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Training - LISE/CNS Safety Training - LISE 311
Trainer: Jim Reynolds
This training is required as part of the CNS/NNIN User Program enrollment process. All enrolling users must take this training. The only exceptions are those who are going to be NNIN/C computational users ONLY or Remote Only Users. This training can be taken prior to turning in your enrollment paperwork. |
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Time |
Max Attendees |
Available |
Open Event! |
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9:30 am - 12:00 pm
For map showing LISE Building see: map.harvard.edu |
14 |
8 |
Register!
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Training - Soft Materials Cleanroom training - LISE G07
Trainer: Monica Zugravu
Safety concerns and a brief description of equipment will be discussed. Please be on time. I will wait for you 10 min. max. and then I will start the training inside G07. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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9:30 am - 10:30 am
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5 |
2 |
Register!
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Training - Sputter coater training (HAR-024) - LISE B15A
Trainer: Andrew Magyar
Training to use the Sputter Coater in B15A (HAR-024). This tool is used to deposit thin layers (10s of nm) of Au, Cr, and Pt-Pd on samples to improve sample conductivity for electron microscopy. Trainees may bring a sample to coat. Please note that B15A Safety Training is needed to use the Sputter Coater (available at 10 AM). |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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10:30 am - 11:00 am
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4 |
FULL |
Registration Closed
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Training - Thermo Scientific K-Alpha XPS Training - G27
Trainer: Hao-Yu (Greg) Lin
Training on the new Thermo XPS system. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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10:00 am - 1:00 pm
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4 |
FULL |
Registration Closed
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Training - WiTec Confocal Raman Microscope Trainining - LISE-G12
Trainer: Jiangdong Deng
This training will cover the basic principle and operation procedure of WiTec Confocal Raman Microscope system. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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2:00 pm - 4:00 pm
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4 |
3 |
Register!
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Wednesday, May 29th, 2013 |
Training - Advanced SPM (scanning Probe Micrscope) techniques - LISE-G12
Trainer: Jiangdong Deng
In this advanced SPM training session, some special techniques of SPM (mainly on Asylum-AFM system) will be introduced, including MFM, ORCA, nano-indentation, SPM-lithography and others. Before taking this training, user should pass the basic AFM training session, and have the access of Asylum-AFM. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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1:30 pm - 3:30 pm
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2 |
1 |
Register!
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Training - Edwards EE-2 e-beam evaporator training - LISE G07 (CNS cleanroom) – PVD Bay
Trainer: Ed Macomber
Edwards EE-2 e-beam evaporator is capable of depositing many oxides and nitrides such as SiO2, Al2O3, TiO2, MgF2, Si3N4, etc., as well as some common metals, if needed. The operating pressure of the system is E-5 to E-6 torr. Users supply their own crucibles and materials for EE-2. The system deposits directionally so that the sidewalls of features are not coated. This makes the system a preferable choice for processing devices that will undergo a lift-off later in the fabrication chain. The training entails going through an entire operating procedure using a mock test sample. |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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1:00 pm - 3:00 pm
(Check confirmation email for document links) |
4 |
3 |
Register!
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Training - LSD-100 Scriber/Cleaver for III-V materials - LISE G12
Trainer: Guixiong Zhong
Basic training to use scriber/cleaver. LSD-100 is an ideal tool for scribing/cleaving III-V compounds. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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3:00 pm - 4:30 pm
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2 |
2 |
Register!
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Training - Metrology for Nanofabrication Part-1 (Contact Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07
Trainer: Jason Tresback
This metrology training event will focus on fundamental measurement tools for nanofabrication including, contact/surface Profilometer (Veeco DekTek 6m), single wavelength scanning Ellipsometer (Gaertner-LSE), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station). Full access to the tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom. |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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10:00 am - 12:00 pm
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5 |
5 |
Register!
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Training - Metrology for Nanofabrication-Part 2 (Optical Profilometry and Veeco AFM) - LISE G07
Trainer: Jason Tresback
This training event covers some advanced metrology techniques, such as Optical Profiler (Wyko NT1100 and CCI HD) (PL-2/6) and Atomic Force Microscopy (Veeco NanoMan AFM) (SPM-5). Training on each tool may take up to 1 hour and after signing up for the course, users should also send an email to the CNS staff (jtresback@cns.fas.harvard.edu) to identify the tool they would like to learn and a brief description of the measurement goal. Metrology for Nanofabrication-1 is NOT required to attend this part-2 training. Full access to the Atomic Force Microscope (SPM-5) will require at least one individual user assisted session on a separate day. We meet inside the cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom. |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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3:00 pm - 5:00 pm
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4 |
4 |
Register!
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Training - RIE-8 STS RIE training - LISE CNS Cleanroom G 07 at the tool
Trainer: Ling Xie
Introduction
The STS MPX/LPX RIE system is an Inductively Coupled Plasma Reactor that is used for Reactive Ion Etch. Using the ICP technology, this etch system is characterized with high plasma density, low operating pressure, high etch rate, excellent etch uniformity and low energy ion damage. Equipped with a chiller, the MPX/LPX system allows the substrate temperature to be controlled from 15 to 30°C.
Attention: Only Si-based materials, including Si, a-Si, SiO2, and Si3N4, are allowed to be etched in this system. All other materials are forbidden.
Chamber Pre-Cleaning Requirement: Please run “O2PlasmaClean” recipe for 20 min. at the beginning to clean the reactor then run minimum 5 - 10 min the recipe you will use for your samples to pre-condition the reactor.
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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1:30 pm - 3:00 pm
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4 |
4 |
Register!
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Training - SP-3 AJA sputtering system training – 3-gun system - CNS cleanroom (G-07) Dry Bay
Trainer: Ed Macomber
This training is for standard operating procedure of SP-3 sputtering system. The system has one RF source and two DC sources (DC power supply is switchable between the two sources). SP-3 can deposit many different materials including conductive metals and oxide and nitride materials (Al, Cu, Si3N4, SiO2, etc.). No ferromagnetics (including Ni, Fe, Co) are allowed in SP-3. CNS does not supply Au or Pt for use in SP-3. The system has process O2 flow, process N2 flow, substrate heating to 850C, and can facilitate co-sputtering with one RF and one DC gun. After an additional one-to one training for target changes, the user can then change targets to fit their own schedule. After 4 uses (with no problems) users are given 24/7 access. |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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3:00 pm - 4:00 pm
(check document links in confirmation email) |
4 |
FULL |
Registration Closed
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Training - SU-8 process training - Meet in the photolithography bay of the main cleanroom G07
Trainer: Hao-Yu (Greg) Lin
Training on the use of MJB4 contact aligners, with a focus on SU-8 resist process. Resist development is also demonstrated. Both wet bench training and cleanroom photolithography spinner training are required before taking this class. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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2:00 pm - 4:00 pm
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4 |
3 |
Register!
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Training - Wetbench Use and Safety Training - OUTSIDE the entrance to CNS Cleanroom (G-07). (YES, we meet OUTSIDE in the HALL)
Trainer: Mac Hathaway
Wetbench Safety Training |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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10:00 am - 12:30 pm
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8 |
7 |
Register!
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Training - wire bonder training - LISE G12
Trainer: Guixiong Zhong
Basic training to use the wire bonder. Wedge bonder configured for aluminum wire (.001"). The system is tuned for bonding the wire to gold. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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1:30 pm - 3:00 pm
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2 |
1 |
Register!
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Thursday, May 30th, 2013 |
Training - Atomic Force Microscopy Part-2 Individual User Qualification (MFP3D -AFM) - LISE G12
Trainer: Jason Tresback
This training event is designed to allow individual users to operate the Asylum MFP3d AFM with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own sample and/or probe tip’s, otherwise they will be provided for training purposes. Full tool access requires attending part 1-basic operation and demonstration by staff, followed by at least one user assisted session on another day that serves as an individual user qualification, and users are encouraged to bring a sample. |
| |
Time |
Max Attendees |
Available |
CNS Users ONLY |
| |
2:00 pm - 5:00 pm
|
3 |
FULL |
Registration Closed
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Training - Cleabroom Orientation (Nanofabrication)-Thursday - LISE-G07, outside the cleanroom door
Trainer: Jiangdong Deng
Cleanroom orientation is required to get the cleanroom access. Staff will bring you into the main cleanroom and introduce the gowning protocol, facilities and equipment in each technique area, safety rules in the cleanroom, and others. |
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Time |
Max Attendees |
Available |
Open Event! |
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2:30 pm - 4:00 pm
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5 |
5 |
Register!
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Training - CVD-13 - PECVD Diamond - SEKI AX5010 - LISE - G27
Trainer: Philippe de Rouffignac
This training covers diamond seeding and diamond deposition on the SEKI AX5010 system. Please email me if you have an urgent need to be trained earlier or are in need for assisted use. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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3:00 pm - 4:30 pm
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3 |
2 |
Register!
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Training - G06 CHEMICAL NANOTECHNOLOGY ROOM TRAINING - LISE G06
Trainer: Monica Zugravu
Safety features of the Chemical Nanotechnology room including the two ReynoldsTech wet benches will be presented.
Please be on time. I will wait for you 10 min. max. and then I will start the training inside G06. Unfortunately, if you are late, I may not hear you knock on the door while I give the training. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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11:30 am - 12:00 pm
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5 |
5 |
Register!
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Training - Introduction to Photolithography/Contact Aligner Training - Meet in the photolithography bay of the cleanroom - please be prompt!
Trainer: Steven Hickman
Training on the use of the MJB3 and MJB4 contact aligners, with a focus on positive resist processes. Resist development is also demonstrated. Both wet bench training and cleanroom photolithography spinner training are required before taking this class. If you will primarily be working with SU-8, a recommended alternative is "SU-8 process training". |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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1:00 pm - 2:30 pm
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4 |
3 |
Register!
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Training - Live Cell Microscope in G05 - LISE G05
Trainer: Arthur McClelland
Learn to use the live cell microscope in G05 for time lapse acquisition with phase contrast or fluorescence. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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2:00 pm - 4:00 pm
turn right exiting the elevators and loop around to G05 door |
2 |
1 |
Register!
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Training - MicroCT Training - LISE G27
Trainer: Fettah Kosar
Covers the basic training on the X-Tek HMXST225 X-ray imaging and computed tomography system, as well as a brief introduction to VGStudio Max 2.0 3D visualization and rendering software. For more information about our MicroCT system, please visit the instrument's webpage at:
http://www.cns.fas.harvard.edu/facilities/tool_detail.php?MID=151
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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1:30 pm - 5:00 pm
PREREQUISITE: Complete the "CNS X-Ray Safety Requirements Form" prior to the training and submit it to CNS Admin Office in LISE 306. |
3 |
2 |
Register!
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Training - Photolithography (Headway) Spinner Training - Meet in the photolithography bay of the cleanroom - please be prompt!
Trainer: Steven Hickman
Training on the use of the Headway resist spinners. Will cover general operation of the spinners, with a focus on preparing positive resist films. Wet bench training is required before taking this class. |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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9:00 am - 11:00 am
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6 |
4 |
Register!
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Training - Quantox Non-contact electrical measurement system training - G-27
Trainer: Philippe de Rouffignac
This training will provide users with the information necessary to operate the quantox tool effectively and safely. The tool can measure a variety of electrical properties of dielectric films on 6" silicon wafers. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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1:30 pm - 3:00 pm
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4 |
4 |
Register!
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Training - Sharon TE-3, 4, and 5 thermal evaporator training - LISE G07 (CNS Cleanroom), PVD Bay
Trainer: Ed Macomber
Training on TE-3, 4 and 5 for thermal evaporation of metals is covered. We meet at the system in the CNS cleanroom PVD bay. Training takes about 2 hours. Venting, loading a sample, pumping and evaporation are performed and explained. After this training you will have access to all 3 systems, which are collectively capable of depositing: Ti, Cr, Cu, Ag, Au, Al, etc. |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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1:00 pm - 3:00 pm
(Please review document links in email confirmation) |
4 |
4 |
Register!
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Training - Soft Lithography training - G06
Trainer: Hao-Yu (Greg) Lin
Training on all tools at Soft Lithography Foundry located in G06, including UV Flood Exposure System, KLA-Tencor P-16+ Contact Stylus Profiler, Thinky Mixer, Plasma Prep II and Xerox Wax Printer. Please complete the LISE G06 Room Safety Training before this class. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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2:30 pm - 4:30 pm
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2 |
FULL |
Registration Closed
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Friday, May 31st, 2013 |
Training - Disco ADA-321 Automatic Dicing Saw Training Part 2-User Qualification - LISE G06
Trainer: Jason Tresback
This training event will allow individual users to operate the dicing saw with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own samples, otherwise a one will be provided for training purposes. Full tool access requires attending part 1-basic operation and demonstration by staff, followed by individual User qualification on another day, AND completion of the LISE G06 Room Safety Training events. Please register for each event. |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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2:00 pm - 5:00 pm
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3 |
3 |
Register!
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Training - JA Woollam Spectroscopic Ellipsometer - LISE-G07, metrology bay
Trainer: Jiangdong Deng
This trainng will cover the basic principle, operation procedure and data analysis (basic) of JAW spectro-ellipsometer. |
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Time |
Max Attendees |
Available |
LISE Cleanroom Users ONLY |
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10:00 am - 12:00 pm
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4 |
4 |
Register!
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Training - UV-VIS Spectrometer - LISE G04
Trainer: Arthur McClelland
Learn to use the UV-VIS spectrometer for optical absorption measurements |
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Time |
Max Attendees |
Available |
CNS Users ONLY |
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10:00 am - 11:00 am
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3 |
2 |
Register!
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